发明授权
- 专利标题: Method and its apparatus for reviewing defects
- 专利标题(中): 检查缺陷的方法及其设备
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申请号: US12416273申请日: 2009-04-01
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公开(公告)号: US08121397B2公开(公告)日: 2012-02-21
- 发明人: Minoru Harada , Ryo Nakagaki , Kenji Obara
- 申请人: Minoru Harada , Ryo Nakagaki , Kenji Obara
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2008-095657 20080402
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A method for reviewing a defect on a sample involves the steps of imaging a defect image containing the defect in first magnification by using an image acquisition unit, synthesizing a reference image not containing the defect from the defect image, comparing the defect image acquired with the reference image synthesized to detect a defect applicant, executing a processing for classifying the defect applicant into a defect and a normal portion and imaging only the portion identified as the detect in second magnification. The method makes it possible to specify a defect position without error from the image taken in the first magnification and to image the defect in the second magnification when a large number of defects are observed within a short time by using the image acquisition unit.
公开/授权文献
- US20090252403A1 METHOD AND ITS APPARATUS FOR REVIEWING DEFECTS 公开/授权日:2009-10-08
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