Invention Grant
- Patent Title: Method and apparatus for inspecting defects
- Patent Title (中): 检查缺陷的方法和装置
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Application No.: US12420932Application Date: 2009-04-09
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Publication No.: US08121398B2Publication Date: 2012-02-21
- Inventor: Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
- Applicant: Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2008-101338 20080409
- Main IPC: G06K9/00
- IPC: G06K9/00 ; H04N5/335

Abstract:
A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
Public/Granted literature
- US20090257647A1 Method and Apparatus for Inspecting Defects Public/Granted day:2009-10-15
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