Invention Grant
- Patent Title: High hole mobility semiconductor device
- Patent Title (中): 高空穴迁移率半导体器件
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Application No.: US11823516Application Date: 2007-06-28
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Publication No.: US08124959B2Publication Date: 2012-02-28
- Inventor: Mantu K. Hudait , Suman Datta , Robert S. Chau , Marko Radosavljevic
- Applicant: Mantu K. Hudait , Suman Datta , Robert S. Chau , Marko Radosavljevic
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/0328

Abstract:
One embodiment of the invention includes a high hole mobility p-channel GaAsySb1-y quantum well with a silicon substrate and an InxAl1-xAs barrier layer.
Public/Granted literature
- US20090001350A1 High hole mobility semiconductor device Public/Granted day:2009-01-01
Information query
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