发明授权
- 专利标题: Reflective film interface to restore transverse magnetic wave contrast in lithographic processing
- 专利标题(中): 反光膜界面,以恢复光刻处理中的横向磁波对比度
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申请号: US12208358申请日: 2008-09-11
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公开(公告)号: US08125618B2公开(公告)日: 2012-02-28
- 发明人: Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
- 申请人: Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: DeLio & Peterson, LLC
- 代理商 Kelly M. Nowak; Wenjie Li
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An imaging tool projects radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist and reflecting back to the resist to form an interference pattern of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.
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