发明授权
- 专利标题: Plasma supply device
- 专利标题(中): 等离子体供应装置
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申请号: US12166963申请日: 2008-07-02
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公开(公告)号: US08129653B2公开(公告)日: 2012-03-06
- 发明人: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
- 申请人: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
- 申请人地址: DE Freiburg
- 专利权人: HUETTINGER Elektronik GmbH + Co. KG
- 当前专利权人: HUETTINGER Elektronik GmbH + Co. KG
- 当前专利权人地址: DE Freiburg
- 代理机构: Fish & Richardson P.C.
- 主分类号: B23K10/00
- IPC分类号: B23K10/00
摘要:
A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.
公开/授权文献
- US20090026968A1 PLASMA SUPPLY DEVICE 公开/授权日:2009-01-29
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