Invention Grant
- Patent Title: Method for preparing an oriented-porosity dielectric material on a substrate by means of electromagnetic and/or photonic treatment
- Patent Title (中): 通过电磁和/或光子处理在衬底上制备取向孔隙介电材料的方法
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Application No.: US12035885Application Date: 2008-02-22
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Publication No.: US08133548B2Publication Date: 2012-03-13
- Inventor: Aziz Zenasni
- Applicant: Aziz Zenasni
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR0753451 20070223
- Main IPC: C08F2/52
- IPC: C08F2/52

Abstract:
Provided a method for producing an oriented-porosity dielectric material on a substrate. The method includes depositing a vapor phase on a substrate of a composite layer comprising a material forming a matrix and a compound comprising chemical groups capable of being oriented under the effect of an electromagnetic field and/or photonic radiation; treating the composite layer to obtain the cross-linking of the material forming a matrix; and subjecting the substrate coated with the composite layer to an electromagnetic field and/or a photonic radiation.
Public/Granted literature
- US20090148617A1 METHOD OF PREPARING A POROUS DIELECTRIC MATERIAL ON A SUBSTRATE Public/Granted day:2009-06-11
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