发明授权
- 专利标题: Heterocyclic radical or diradical, the dimers, oligomers, polymers, dispiro compounds and polycycles thereof, the use thereof, organic semiconductive material and electronic or optoelectronic component
- 专利标题(中): 二环,二聚体,低聚物,聚合物,二恶烷化合物及其多环,其用途,有机半导体材料和电子或光电子组件
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申请号: US11688777申请日: 2007-03-20
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公开(公告)号: US08134146B2公开(公告)日: 2012-03-13
- 发明人: Michael Limmert , Olaf Zeika , Martin Ammann , Horst Hartmann , Ansgar Werner
- 申请人: Michael Limmert , Olaf Zeika , Martin Ammann , Horst Hartmann , Ansgar Werner
- 申请人地址: DE Dresden
- 专利权人: Novaled AG
- 当前专利权人: Novaled AG
- 当前专利权人地址: DE Dresden
- 代理机构: Sutherland Asbill & Brennan LLP
- 优先权: EP06005687 20060321
- 主分类号: H01L51/00
- IPC分类号: H01L51/00 ; C07D207/00 ; C07D209/56 ; C07D221/00 ; C07D239/00 ; C07D241/00 ; C07D245/00 ; C07D307/00 ; C07D333/00
摘要:
The present invention relates to heterocyclic radicals or diradicals, the dimers, oligomers, polymers, dispiro compounds and polycycles thereof, to the use thereof to organic semiconductive materials and to electronic and optoelectronic components.
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