发明授权
US08137869B2 Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby
有权
光学元件，光刻设备，用于制造和/或保护光学元件的方法，由此制造的器件制造方法和器件
- 专利标题： Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby
- 专利标题（中）： 光学元件，光刻设备，用于制造和/或保护光学元件的方法，由此制造的器件制造方法和器件
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申请号： US10936716申请日： 2004-09-09
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公开(公告)号： US08137869B2公开(公告)日： 2012-03-20
- 发明人: Levinus Pieter Bakker
- 申请人： Levinus Pieter Bakker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands, B.V.
- 当前专利权人： ASML Netherlands, B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03077850 20030910
- 主分类号： G02B27/44
- IPC分类号： G02B27/44 ; G02B5/18
摘要：
A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.