发明授权
US08138020B2 Wafer level integrated interconnect decal and manufacturing method thereof 有权
晶圆级集成互连贴花及其制造方法

Wafer level integrated interconnect decal and manufacturing method thereof
摘要:
A wafer level integrated interconnect decal manufacturing method and wafer level integrated interconnect decal arrangement. In accordance with the technology concerning the soldering of integrated circuits and substrates, and particularly providing for solder decal methods forming and utilization, in the present instance there are employed underfills which consist of a solid film material and which are applied between a semiconductor chip and the substrate in order to enhance the reliability of a flip chip package. In particular, the underfill material increases the resistance to fatigue of controlled collapse chip connect (C4) bumps.
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