发明授权
- 专利标题: Wafer level integrated interconnect decal and manufacturing method thereof
- 专利标题(中): 晶圆级集成互连贴花及其制造方法
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申请号: US12731793申请日: 2010-03-25
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公开(公告)号: US08138020B2公开(公告)日: 2012-03-20
- 发明人: Peter A. Gruber , Jae-Woong Nah
- 申请人: Peter A. Gruber , Jae-Woong Nah
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Scully, Scott, Murphy & Presser, P.C.
- 代理商 Daniel P. Morris, Esq.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A wafer level integrated interconnect decal manufacturing method and wafer level integrated interconnect decal arrangement. In accordance with the technology concerning the soldering of integrated circuits and substrates, and particularly providing for solder decal methods forming and utilization, in the present instance there are employed underfills which consist of a solid film material and which are applied between a semiconductor chip and the substrate in order to enhance the reliability of a flip chip package. In particular, the underfill material increases the resistance to fatigue of controlled collapse chip connect (C4) bumps.
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