发明授权
US08143533B2 Method for forming resist pattern, method for producing circuit board, and circuit board
失效
抗蚀剂图案形成方法,电路基板的制造方法以及电路基板
- 专利标题: Method for forming resist pattern, method for producing circuit board, and circuit board
- 专利标题(中): 抗蚀剂图案形成方法,电路基板的制造方法以及电路基板
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申请号: US12227377申请日: 2006-05-17
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公开(公告)号: US08143533B2公开(公告)日: 2012-03-27
- 发明人: Yasuo Kaneda , Munetoshi Irisawa , Yuji Toyoda , Toyokazu Komuro , Katsuya Fukase , Toyoaki Sakai
- 申请人: Yasuo Kaneda , Munetoshi Irisawa , Yuji Toyoda , Toyokazu Komuro , Katsuya Fukase , Toyoaki Sakai
- 申请人地址: JP Tokyo JP Nagano-shi
- 专利权人: Mitsubishi Paper Mills Limited,Shinko Electric Industries Co., Ltd.
- 当前专利权人: Mitsubishi Paper Mills Limited,Shinko Electric Industries Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Nagano-shi
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 国际申请: PCT/JP2006/309851 WO 20060517
- 国际公布: WO2007/132533 WO 20071122
- 主分类号: H05K1/03
- IPC分类号: H05K1/03
摘要:
There are provided a method for forming a resist pattern for preparing a circuit board having a landless or small-land-width through-hole(s) to realize a high-density circuit board, a method for producing a circuit board, and a circuit board. A method for forming a resist pattern, comprising the steps of forming a resin layer and a mask layer on a first surface of a substrate having a through-hole(s), and removing the resin layer on the through-hole(s) and on a periphery of the through-hole(s) on the first surface by supplying a resin layer removing solution from a second surface opposite to the first surface of the substrate, and a method for producing a circuit board using the method for forming a resist pattern, and a circuit board.
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