发明授权
- 专利标题: Extreme ultra violet light source device
- 专利标题(中): 极紫外光源装置
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申请号: US11730139申请日: 2007-03-29
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公开(公告)号: US08143606B2公开(公告)日: 2012-03-27
- 发明人: Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
- 申请人: Hiroshi Komori , Yoshifumi Ueno , Georg Soumagne
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Komatsu Ltd.,Gigaphoton Inc.
- 当前专利权人: Komatsu Ltd.,Gigaphoton Inc.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2006-097037 20060331
- 主分类号: H05G2/00
- IPC分类号: H05G2/00
摘要:
An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
公开/授权文献
- US20070228298A1 Extreme ultra violet light source device 公开/授权日:2007-10-04
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