Invention Grant
US08151220B2 Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data
有权
用于模拟标线布局数据,检查标线布局数据以及生成检查标线布局数据的过程的方法
- Patent Title: Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data
- Patent Title (中): 用于模拟标线布局数据,检查标线布局数据以及生成检查标线布局数据的过程的方法
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Application No.: US11003291Application Date: 2004-12-03
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Publication No.: US08151220B2Publication Date: 2012-04-03
- Inventor: Carl Hess , Yalin Xiong
- Applicant: Carl Hess , Yalin Xiong
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corp.
- Current Assignee: KLA-Tencor Technologies Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F11/22

Abstract:
Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle layout data. The method also includes assigning one or more inspection parameters to the first region and the second region such that the first region will be inspected during the process with a higher sensitivity than the second region. Another method includes inspecting the first region with a higher sensitivity than the second region. An additional method includes simulating how the reticle layout data will print. Simulation of the first and second regions is performed with one or more different simulation parameters such that the first region is simulated with a higher fidelity than the second region.
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