Invention Grant
US08159012B2 Semiconductor device including insulating layer of cubic system or tetragonal system 有权
半导体器件包括立方体或四方晶系的绝缘层

Semiconductor device including insulating layer of cubic system or tetragonal system
Abstract:
Provided is a semiconductor device including an insulating layer of a cubic system or a tetragonal system, having good electrical characteristics. The semiconductor device includes a semiconductor substrate including an active region, a transistor that is formed in the active region of the semiconductor substrate, an interlevel insulating layer that is formed on the semiconductor substrate and a contact plug that is formed in the interlevel insulating layer and that is electrically connected to the transistor. The semiconductor device may include a lower electrode that is formed on the interlevel insulating layer and that is electrically connected to the contact plug, an upper electrode that is formed on the lower electrode and an insulating layer of a cubic system or a tetragonal system including a metal silicate layer. The insulating layer may be formed between the lower electrode and the upper electrode.
Information query
Patent Agency Ranking
0/0