Invention Grant
- Patent Title: R-Fe-B based sintered magnet having on the surface thereof vapor deposited film of aluminum or alloy thereof, and method for producing the same
- Patent Title (中): 在其表面具有铝或其合金的蒸镀膜的R-Fe-B系烧结磁体及其制造方法
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Application No.: US12599145Application Date: 2008-05-09
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Publication No.: US08163106B2Publication Date: 2012-04-24
- Inventor: Atsushi Kikugawa , Koshi Yoshimura , Yoshimi Tochishita , Masanao Kamachi , Nobuhiro Misumi
- Applicant: Atsushi Kikugawa , Koshi Yoshimura , Yoshimi Tochishita , Masanao Kamachi , Nobuhiro Misumi
- Applicant Address: JP Tokyo
- Assignee: Hitachi Metals, Ltd.
- Current Assignee: Hitachi Metals, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2007-124877 20070509
- International Application: PCT/JP2008/058661 WO 20080509
- International Announcement: WO2008/140054 WO 20081120
- Main IPC: H01F1/057
- IPC: H01F1/057

Abstract:
An R—Fe—B sinlered magnet having on the surface thereof a vapor deposited film of aluminum or an alloy thereof and a method for producing the same. The vapor deposited film of aluminum or an alloy thereof comprises a columnar crystalline structure grown broader from the surface of the R—Fe—B sintered magnet body outward to the outer surface, which has a part within a region defined in the thickness direction of the film as taken from the surface of the R—Fe—B sintered magnet to ⅓ of the film thickness, 5 to 30 intercrystalline gaps of 0.01 μm to 1 μm in width as counted per 10 μm length in the lateral direction of the film. The method comprises controlling the average film formation rate such that it is slower up to a predetermined point and then is speeded up later thereon.
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