发明授权
US08164231B2 Electret device comprising electret film formed on main surface of substrate and electrostatic operating apparatus
有权
驻极体装置包括在基板的主表面上形成的驻极体膜和静电操作装置
- 专利标题： Electret device comprising electret film formed on main surface of substrate and electrostatic operating apparatus
- 专利标题（中）： 驻极体装置包括在基板的主表面上形成的驻极体膜和静电操作装置
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申请号： US11936542申请日： 2007-11-07
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公开(公告)号： US08164231B2公开(公告)日： 2012-04-24
- 发明人: Katsuji Mabuchi
- 申请人： Katsuji Mabuchi
- 申请人地址： JP Osaka
- 专利权人： Sanyo Electric Co., Ltd.
- 当前专利权人： Sanyo Electric Co., Ltd.
- 当前专利权人地址： JP Osaka
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 优先权： JP2006-305615 20061110; JP2007-268195 20071015
- 主分类号： H02N1/00
- IPC分类号： H02N1/00
摘要：
An electret device includes a substrate formed with a plurality of recess portions on a main surface thereof and an electret film so formed on the main surface of the substrate as to cover at least inner surfaces of the recess portions.
公开/授权文献
- US20080111444A1 ELECTRET DEVICE AND ELECTROSTATIC OPERATING APPARATUS 公开/授权日：2008-05-15
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