Invention Grant
US08168118B2 Powder metallurgy sputtering targets and methods of producing same 有权
粉末冶金溅射靶及其制造方法

Powder metallurgy sputtering targets and methods of producing same
Abstract:
A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.
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