Invention Grant
US08168496B2 Single die output power stage using trench-gate low-side and LDMOS high-side MOSFETS, structure and method 失效
单晶片输出功率级采用沟槽栅极低边和LDMOS高边MOSFET,结构与方法

  • Patent Title: Single die output power stage using trench-gate low-side and LDMOS high-side MOSFETS, structure and method
  • Patent Title (中): 单晶片输出功率级采用沟槽栅极低边和LDMOS高边MOSFET,结构与方法
  • Application No.: US12471911
    Application Date: 2009-05-26
  • Publication No.: US08168496B2
    Publication Date: 2012-05-01
  • Inventor: Francois Hebert
  • Applicant: Francois Hebert
  • Applicant Address: US CA Milpitas
  • Assignee: Intersil Americas Inc.
  • Current Assignee: Intersil Americas Inc.
  • Current Assignee Address: US CA Milpitas
  • Agency: Fogg & Powers LLC
  • Main IPC: H01L21/336
  • IPC: H01L21/336
Single die output power stage using trench-gate low-side and LDMOS high-side MOSFETS, structure and method
Abstract:
A voltage converter includes an output circuit having a high-side device and a low-side device which can be formed on a single die (a “PowerDie”). The high-side device can include a lateral diffused metal oxide semiconductor (LDMOS) while the low-side device can include a trench-gate vertical diffused metal oxide semiconductor (VDMOS). The voltage converter can further include a controller circuit on a different die which can be electrically coupled to, and co-packaged with the output circuit.
Information query
Patent Agency Ranking
0/0