发明授权
- 专利标题: Charged particle beam apparatus
- 专利标题(中): 带电粒子束装置
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申请号: US12410174申请日: 2009-03-24
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公开(公告)号: US08168951B2公开(公告)日: 2012-05-01
- 发明人: Takeshi Kawasaki , Tomonori Nakano
- 申请人: Takeshi Kawasaki , Tomonori Nakano
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2005-028372 20050204
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle beam source; a charged particle beam gun including a means for converging a charged particle beam; an acceleration means for accelerating a charged particle beam emitted from the charged particle beam gun; and an aberration correction means disposed between the charged particle beam gun and the acceleration means, in which an aberration enough to cancel out an aberration of a charged particle beam on the specimen surface is provided to an extraction electrical potential or an equivalent beam at the initial acceleration stage.
公开/授权文献
- US20090184243A1 CHARGED PARTICLE BEAM APPARATUS 公开/授权日:2009-07-23
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