Invention Grant
- Patent Title: Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
- Patent Title (中): 用于聚焦离子束系统的磁感应耦合等离子体源
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Application No.: US12704123Application Date: 2010-02-11
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Publication No.: US08168957B2Publication Date: 2012-05-01
- Inventor: John Keller , Noel Smith , Roderick Boswell , Lawrence Scipioni , Christine Charles , Orson Sutherland
- Applicant: John Keller , Noel Smith , Roderick Boswell , Lawrence Scipioni , Christine Charles , Orson Sutherland
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Griner LLP
- Agent Michael O. Scheinberg; John Kelly
- Main IPC: H01J49/10
- IPC: H01J49/10 ; H01J27/02
Abstract:
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
Public/Granted literature
- US20100294648A1 Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System Public/Granted day:2010-11-25
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