发明授权
- 专利标题： Sulfonium compound
- 专利标题（中）： 锍化合物
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申请号： US12729550申请日： 2010-03-23
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公开(公告)号： US08173353B2公开(公告)日： 2012-05-08
- 发明人: Tatsuro Masuyama , Junji Shigematsu , Hanwoo Park
- 申请人： Tatsuro Masuyama , Junji Shigematsu , Hanwoo Park
- 申请人地址： JP Tokyo
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2009-075996 20090326
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07C309/12
摘要：
The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a β-ketoester structure and A+ represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
公开/授权文献
- US20100248135A1 SULFONIUM COMPOUND 公开/授权日：2010-09-30
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