公开(公告)号：US08173353B2

公开(公告)日：2012-05-08

申请号：US12729550

申请日：2010-03-23

申请人： Tatsuro Masuyama ,  Junji Shigematsu ,  Hanwoo Park

发明人： Tatsuro Masuyama ,  Junji Shigematsu ,  Hanwoo Park

IPC分类号： G03F7/004 ,  C07C309/12

CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/122 ,  Y10S430/123

摘要： The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a β-ketoester structure and A+ represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

摘要翻译： 本发明提供由式（I）表示的锍化合物：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，R1表示具有β-酮基结构的C 5 -C 42有机基团和A + 代表有机抗衡离子，以及包含上述锍化合物的化学放大光致抗蚀剂组合物和包含具有酸不稳定基团的结构单元的树脂，其在碱性水溶液中不溶或难溶，但变得可溶于碱水溶液 溶液通过酸的作用。

公开(公告)号：US08426106B2

公开(公告)日：2013-04-23

申请号：US12903146

申请日：2010-10-12

申请人： Tatsuro Masuyama ,  Kazuhiko Hashimoto ,  Junji Shigematsu

发明人： Tatsuro Masuyama ,  Kazuhiko Hashimoto ,  Junji Shigematsu

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC分类号： C08F120/34 ,  C07C251/66 ,  C07C309/70 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of −1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

摘要翻译： 一种光致抗蚀剂组合物，其包含包含衍生自由式（I）表示的化合物的结构单元的聚合物：其中R 1表示氢原子或甲基，R 2表示可以具有一个或多个取代基的C 6 -C 12芳族烃基， R3表示可以具有一个或多个取代基且可以含有一个或多个杂原子的氰基或C 1 -C 12烃基，A 1表示单键， - （CH 2）g -CO-O- *或 - （CH 2） hO-CO-（CH2）i-CO-O- *其中g，h和i各自独立地表示1-6的整数，*表示与氮原子的结合位置，具有酸不稳定基团的树脂和 在碱性水溶液中不溶或难溶，但通过酸和酸生成剂可溶于碱水溶液。

公开(公告)号：US08951709B2

公开(公告)日：2015-02-10

申请号：US13280969

申请日：2011-10-25

申请人： Tatsuro Masuyama ,  Satoshi Yamamoto ,  Koji Ichikawa

发明人： Tatsuro Masuyama ,  Satoshi Yamamoto ,  Koji Ichikawa

IPC分类号： G03F7/00 ,  G03F7/20 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

摘要翻译： 抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C36脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

公开(公告)号：US20100304294A1

公开(公告)日：2010-12-02

申请号：US12786799

申请日：2010-05-25

申请人： Koji ICHIKAWA ,  Masako Sugihara ,  Tatsuro Masuyama

发明人： Koji ICHIKAWA ,  Masako Sugihara ,  Tatsuro Masuyama

IPC分类号： G03F7/004 ,  C07D307/00 ,  G03F7/20 ,  C07D307/04

CPC分类号： C07D307/80 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

摘要翻译： 由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物 通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

公开(公告)号：US09176379B2

公开(公告)日：2015-11-03

申请号：US13441205

申请日：2012-04-06

申请人： Koji Ichikawa ,  Takahiro Yasue ,  Tatsuro Masuyama

发明人： Koji Ichikawa ,  Takahiro Yasue ,  Tatsuro Masuyama

IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/20 ,  G03F7/039

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

摘要翻译： 抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过 碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

公开(公告)号：US08354217B2

公开(公告)日：2013-01-15

申请号：US12786799

申请日：2010-05-25

申请人： Koji Ichikawa ,  Masako Sugihara ,  Tatsuro Masuyama

发明人： Koji Ichikawa ,  Masako Sugihara ,  Tatsuro Masuyama

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/04

CPC分类号： C07D307/80 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

摘要翻译： 由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物 通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

公开(公告)号：US08329377B2

公开(公告)日：2012-12-11

申请号：US12506942

申请日：2009-07-21

申请人： Ichiki Takemoto ,  Tatsuro Masuyama ,  Takashi Hiraoka

发明人： Ichiki Takemoto ,  Tatsuro Masuyama ,  Takashi Hiraoka

IPC分类号： G03F7/004 ,  C07D207/00 ,  C07D209/00 ,  C07D221/14 ,  C07D295/00 ,  C08F226/06

CPC分类号： C07D221/04 ,  C07D207/46 ,  C07D209/48 ,  C07D209/76 ,  C07D217/22

摘要： An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.

摘要翻译： 由式（I）表示的酰亚胺化合物：其中R1表示C1-C20脂族烃基等，W1表示-CO-O-等，Q1和Q2各自独立地表示氟原子等，A表示 由式（I-1）表示的基团：其中A1表示-CH2-CH2-等，和含有该基团的化学放大抗蚀剂组合物。

公开(公告)号：US08318403B2

公开(公告)日：2012-11-27

申请号：US12787184

申请日：2010-05-25

申请人： Koji Ichikawa ,  Masako Sugihara ,  Tatsuro Masuyama

发明人： Koji Ichikawa ,  Masako Sugihara ,  Tatsuro Masuyama

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028

CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2601/04 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/18 ,  C07C2602/08 ,  C07C2602/10 ,  C07C2602/42 ,  C07C2602/44 ,  C07C2603/68 ,  C07C2603/74 ,  C07C2603/86 ,  C07D307/77 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

摘要翻译： 由式（I-CC）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，Y1表示C1-C36脂族烃基等，A1和A2各自独立地表示 代表C1-C20脂族烃基等，Ar1表示可以具有一个或多个取代基的（m4 + 1）价的C6〜C20芳香族烃基，B1表示单键等，B2表示可以为 通过酸的作用消除，m1和m2独立地表示0〜2的整数，m3表示1〜3的整数，条件是m1 + m2 + m3等于3，m4表示1〜 3和包含式（I-CC）表示的盐的光致抗蚀剂组合物和包含具有酸不稳定基团的结构单元的树脂，其在碱性水溶液中不溶或难溶，但溶于碱水溶液 通过酸的作用。

公开(公告)号：US20110039209A1

公开(公告)日：2011-02-17

申请号：US12852237

申请日：2010-08-06

申请人： Tatsuro Masuyama ,  Mitsuhiro Hata

发明人： Tatsuro Masuyama ,  Mitsuhiro Hata

IPC分类号： G03F7/004 ,  C07C271/28 ,  C07C271/22 ,  C07D207/16

CPC分类号： C07D207/16 ,  C07C271/22 ,  C07C271/24 ,  C07C271/28 ,  C07C271/34 ,  C07C271/36 ,  C07C271/38 ,  C07C2601/14 ,  C07C2602/28 ,  C07C2603/74 ,  C07D209/44 ,  C07D211/60 ,  G03F7/0045

摘要： The present invention provides a compound represented by the formula (C1): wherein Rc2 represents a C6-C10 aromatic hydrocarbon group having at least one nitro group and Rc1 represents a group represented by the formula (1): wherein Rc4 represents a hydrogen atom etc., Rc5 represents a C1-C30 divalent hydrocarbon group, and Rc3 represents a group represented by the formula (3-1), (3-2) or (3-3): wherein Rc6, Rc7, Rc8, Rc9, Rc10, Rc11, Rc12, Rc13 and Rc14 each independently represent a C1-C30 hydrocarbon group, and a photoresist composition comprising a resin, an acid generator and the compound represented by the formula (C1).

摘要翻译： 本发明提供由式（C1）表示的化合物：其中Rc2表示具有至少一个硝基的C6-C10芳族烃基，Rc1表示由式（1）表示的基团：其中Rc4表示氢原子等 Rc5表示C1-C30二价烃基，Rc3表示由式（3-1），（3-2）或（3-3）表示的基团：其中Rc6，Rc7，Rc8，Rc9，Rc10， Rc11，Rc12，Rc13和Rc14各自独立地表示C1-C30烃基，以及包含树脂，酸产生剂和由式（C1）表示的化合物的光致抗蚀剂组合物。

公开(公告)号：US09428485B2

公开(公告)日：2016-08-30

申请号：US13491370

申请日：2012-06-07

申请人： Tatsuro Masuyama ,  Yuichi Mukai

发明人： Tatsuro Masuyama ,  Yuichi Mukai

IPC分类号： G03F7/028 ,  C07D321/10 ,  C07C309/10 ,  C07C309/12 ,  C07C381/12 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20

CPC分类号： C07D321/10 ,  C07C309/10 ,  C07C309/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

摘要： A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation.

摘要翻译： 由式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，A1表示C1-C30一价有机基团，X1表示C1-C10脂族烃基，其中氢原子 可以被羟基取代，m1和m2独立地表示1〜4的整数，Z +表示有机阳离子。