发明授权
- 专利标题： Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation
- 专利标题（中）： 用于在产生短波辐射期间除去由辐射源产生的颗粒的方法和装置
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申请号： US10599345申请日： 2005-03-18
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公开(公告)号： US08173975B2公开(公告)日： 2012-05-08
- 发明人: Jeroen Jonkers , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人： Jeroen Jonkers , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人地址： NL Eindhoven
- 专利权人： Koninklijke Philips Electronics N.V.
- 当前专利权人： Koninklijke Philips Electronics N.V.
- 当前专利权人地址： NL Eindhoven
- 优先权： EP04101311 20040331
- 国际申请： PCT/IB2005/050941 WO 20050318
- 国际公布： WO2005/096099 WO 20051013
- 主分类号： G21K5/00
- IPC分类号： G21K5/00
摘要：
A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.