公开(公告)号：US07088424B2

公开(公告)日：2006-08-08

申请号：US11034260

申请日：2005-01-13

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/42

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

摘要翻译： 光刻投影设备包括被配置成由辐射源发射的辐射形成辐射束的辐射系统，以及被配置为保持图案形成装置的支撑件，当图案形成装置被辐射束照射时，辐射束具有 模式。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US20090206279A1

公开(公告)日：2009-08-20

申请号：US10599345

申请日：2005-03-18

申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： A61N5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

摘要： A method for removing contaminant particles (14), such as atoms, molecules, clusters, ions, and the like, produced by means of a radiation source (10) during generation of short-wave radiation (12) having a wavelength of up to approximately 20 nm, by means of a first gas (22) guided at high mass throughput between the radiation source (10) and a particle trap (20) arranged in a wall (16) of a mirror chamber (18) is described that can be used for a lithography device or a microscope. In order to protect an optical device and/or articles to he irradiated against contamination, the method is designed such that a second gas (24) is introduced into the mirror chamber (18) and its pressure is adjusted such that it is at least as high as the pressure of the first gas (22).

摘要翻译： 一种用于去除在产生短波辐射（12）期间通过辐射源（10）产生的污染物颗粒（14）的方法，例如原子，分子，簇，离子等，其具有波长直至 描述了通过在辐射源（10）和布置在反射镜腔（18）的壁（16）中的颗粒捕获器（20）之间以高质量通量引导的第一气体（22）的大约20nm，其可以 用于光刻设备或显微镜。 为了保护光学装置和/或物品以照射到污染物上，该方法被设计成使得第二气体（24）被引入反射镜室（18）中，并且调节其压力使其至少等于 作为第一气体（22）的压力高。

公开(公告)号：US06859259B2

公开(公告)日：2005-02-22

申请号：US10639753

申请日：2003-08-13

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugó Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugó Matthieu Visser

IPC分类号： G21K1/06 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  G03B27/42

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam provides the beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

摘要翻译： 光刻投影设备包括被配置为形成来自辐射源发射的辐射的辐射束的辐射系统，以及被配置为保持图案形成装置的支撑件，当图案形成装置被光束照射时，其提供具有图案的光束。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US08173975B2

公开(公告)日：2012-05-08

申请号：US10599345

申请日：2005-03-18

申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

摘要： A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.

摘要翻译： 在产生具有高达约20nm的波长的短波辐射的产生期间，用于去除由辐射源产生的污染物颗粒（例如原子，分子，簇，离子等）的方法包括：引导第一气体 辐射源和布置在室的壁中的颗粒捕获器。 为了保护光学装置和/或要照射污染的物品，将第二气体引入室内的方法及其压力被调节至至少与第一气体的压力一样高。

公开(公告)号：US07852460B2

公开(公告)日：2010-12-14

申请号：US11482147

申请日：2006-07-07

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/54

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

摘要翻译： 光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一 并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射 第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

公开(公告)号：US07671973B2

公开(公告)日：2010-03-02

申请号：US10596564

申请日：2004-12-16

申请人： Michael Cornelis Van Beek ,  Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Michael Cornelis Van Beek ,  Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G01N33/48

CPC分类号： A61B5/1455 ,  A61B5/14532 ,  A61B5/14546 ,  A61B5/14552 ,  G01J3/36 ,  G01N21/65 ,  G01N33/49

摘要： The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.

摘要翻译： 本发明提供了一种用于确定光信号的主分量的幅度的光学分析系统。 主要成分指示特定化合物或受光谱分析的物质的各种化合物的浓度。 光信号经受由加权函数指定的波长选择加权和波长选择性空间分离。 光信号优选分为对应于加权函数的正和负光谱带的两部分。 分离提供对光信号的分离部分的单独检测，而没有明显的强度损失，从而提供确定的主要分量的改善的信噪比。 光信号的分离和加权由两个多元光学元件实现。

公开(公告)号：US20080212053A1

公开(公告)日：2008-09-04

申请号：US10962744

申请日：2004-10-13

申请人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/42 ,  G03F7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

摘要翻译： 公开了一种装置制造方法。 该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出 所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

公开(公告)号：US20080054189A1

公开(公告)日：2008-03-06

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及配置成调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US07105837B2

公开(公告)日：2006-09-12

申请号：US10844577

申请日：2004-05-13

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G21K5/00

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

公开(公告)号：US07057190B2

公开(公告)日：2006-06-06

申请号：US11000381

申请日：2004-12-01

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC分类号： G03F7/20

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

摘要翻译： 用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。 箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。 箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。