Invention Grant
US08176752B2 Silica glass with saturated induced absorption and method of making
有权
二氧化硅玻璃具有饱和诱导吸收和制备方法
- Patent Title: Silica glass with saturated induced absorption and method of making
- Patent Title (中): 二氧化硅玻璃具有饱和诱导吸收和制备方法
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Application No.: US12507950Application Date: 2009-07-23
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Publication No.: US08176752B2Publication Date: 2012-05-15
- Inventor: Susan Lee Schiefelbein , Charlene Marie Smith
- Applicant: Susan Lee Schiefelbein , Charlene Marie Smith
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert P. Santandrea
- Main IPC: C03B19/00
- IPC: C03B19/00 ; C03C3/06

Abstract:
A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.
Public/Granted literature
- US20110021339A1 Silica Glass With Saturated Induced Absorption and Method of Making Public/Granted day:2011-01-27
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