发明授权
US08178174B2 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
有权
Ag基合金薄膜和用于形成Ag基合金薄膜的溅射靶
- 专利标题: Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
- 专利标题(中): Ag基合金薄膜和用于形成Ag基合金薄膜的溅射靶
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申请号: US12915138申请日: 2010-10-29
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公开(公告)号: US08178174B2公开(公告)日: 2012-05-15
- 发明人: Yuuki Tauchi , Katsutoshi Takagi , Junichi Nakai , Toshiki Sato
- 申请人: Yuuki Tauchi , Katsutoshi Takagi , Junichi Nakai , Toshiki Sato
- 申请人地址: JP Kobe-shi
- 专利权人: Kobe Steel, Ltd.
- 当前专利权人: Kobe Steel, Ltd.
- 当前专利权人地址: JP Kobe-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2002-231596 20020808; JP2002-233283 20020809; JP2002-239972 20020820; JP2002-361117 20021212; JP2003-003643 20030109; JP2003-004586 20030110; JP2003-122314 20030425
- 主分类号: G02B1/10
- IPC分类号: G02B1/10 ; C09K19/52 ; B32B15/00 ; C22C5/06
摘要:
The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.
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