发明授权
US08178174B2 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film 有权
Ag基合金薄膜和用于形成Ag基合金薄膜的溅射靶

Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
摘要:
The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.
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