Invention Grant
US08178378B2 Method of manufacturing vertical nitride semiconductor light emitting diode
有权
立式氮化物半导体发光二极管的制造方法
- Patent Title: Method of manufacturing vertical nitride semiconductor light emitting diode
- Patent Title (中): 立式氮化物半导体发光二极管的制造方法
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Application No.: US12909204Application Date: 2010-10-21
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Publication No.: US08178378B2Publication Date: 2012-05-15
- Inventor: Sang Ho Yoon , Su Yeol Lee , Doo Go Baik , Seok Beom Choi , Tae Sung Jang , Jong Gun Woo
- Applicant: Sang Ho Yoon , Su Yeol Lee , Doo Go Baik , Seok Beom Choi , Tae Sung Jang , Jong Gun Woo
- Applicant Address: KR Gyunggi-do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Gyunggi-do
- Agency: Lowe, Hauptman, Ham & Berner, LLP
- Priority: KR10-2006-0078617 20060821; KR10-2007-0025229 20070314
- Main IPC: H01L21/56
- IPC: H01L21/56

Abstract:
A vertical nitride-based semiconductor LED comprises a structure support layer; a p-electrode formed on the structure support layer; a p-type nitride semiconductor layer formed on the p-electrode; an active layer formed on the p-type nitride semiconductor layer; an n-type nitride semiconductor layer formed on the active layer; an n-electrode formed on a portion of the n-type nitride semiconductor layer; and a buffer layer formed on a region of the n-type nitride semiconductor layer on which the n-electrode is not formed, the buffer layer having irregularities formed thereon. The surface of the n-type nitride semiconductor layer coming in contact with the n-electrode is flat.
Public/Granted literature
- US20110033965A1 VERTICAL NITRIDE SEMICONDUCTOR LIGHT EMITTING DIODE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-02-10
Information query
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