发明授权
- 专利标题: Polymer for forming organic anti-reflective coating layer
- 专利标题(中): 用于形成有机抗反射涂层的聚合物
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申请号: US12485480申请日: 2009-06-16
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公开(公告)号: US08178639B2公开(公告)日: 2012-05-15
- 发明人: Hyun-Jin Kim , Jae-Hyun Kim , Hyo-Jung Roh , Man-Ho Han , Dong-Kyu Ju
- 申请人: Hyun-Jin Kim , Jae-Hyun Kim , Hyo-Jung Roh , Man-Ho Han , Dong-Kyu Ju
- 申请人地址: KR Incheon
- 专利权人: Dongjin Semichem Co., Ltd.
- 当前专利权人: Dongjin Semichem Co., Ltd.
- 当前专利权人地址: KR Incheon
- 代理机构: Kile Park Goekjian Reed & McManus PLLC
- 优先权: KR10-2008-0056453 20080616
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; C08F122/14 ; C08L31/00 ; B05D3/02
摘要:
A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula. Wherein, R1 is a hydrogen atom (H) or a methyl group (—CH3), R2 is a sulfur atom (S) or an oxygen atom (O), R3 is a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, R4 is an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.
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