发明授权
- 专利标题: Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope
- 专利标题(中): 静电电荷测量方法,焦点调整方法和扫描电子显微镜
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申请号: US12792808申请日: 2010-06-03
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公开(公告)号: US08178836B2公开(公告)日: 2012-05-15
- 发明人: Tatsuaki Ishijima , Katsuhiro Sasada , Ritsuo Fukaya
- 申请人: Tatsuaki Ishijima , Katsuhiro Sasada , Ritsuo Fukaya
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Crowell & Moring LLP
- 优先权: JP2007-049927 20070228
- 主分类号: G01N23/00
- IPC分类号: G01N23/00 ; H01J37/26 ; G21K7/00
摘要:
A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
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