发明授权
- 专利标题： Control method for semiconductor manufacturing apparatus, control system for semiconductor manufacturing apparatus, and manufacturing method for semiconductor device
- 专利标题（中）： 半导体制造装置的控制方法，半导体制造装置的控制系统以及半导体装置的制造方法
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申请号： US12497349申请日： 2009-07-02
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公开(公告)号： US08180472B2公开(公告)日： 2012-05-15
- 发明人: Masayuki Hatano , Tetsuro Nakasugi
- 申请人： Masayuki Hatano , Tetsuro Nakasugi
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2008-193132 20080728
- 主分类号： G06F19/00
- IPC分类号： G06F19/00
摘要：
A control method for a semiconductor manufacturing apparatus, comprising: generating, as log data, a history of operation states of the semiconductor manufacturing apparatus when a wafer is processed by the semiconductor manufacturing apparatus; specifying, based on the log data, processing results in which operation states of the semiconductor manufacturing apparatus are abnormal states out of processing results after the processing of the wafer processed by the semiconductor manufacturing apparatus as abnormal processing results; creating control data for the semiconductor manufacturing apparatus based on the processing results and the abnormal processing results; and controlling the processing by the semiconductor manufacturing apparatus using the control data.
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