发明授权
- 专利标题： Method for manufacturing display device including laser irradiation and selective removing of a light absorber layer
- 专利标题（中）： 用于制造包括激光照射和选择性去除光吸收层的显示装置的方法
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申请号： US11881233申请日： 2007-07-26
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公开(公告)号： US08183067B2公开(公告)日： 2012-05-22
- 发明人: Shunpei Yamazaki , Koichiro Tanaka , Hironobu Shoji , Ikuko Kawamata
- 申请人： Shunpei Yamazaki , Koichiro Tanaka , Hironobu Shoji , Ikuko Kawamata
- 申请人地址： JP
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP
- 代理机构： Husch Blackwell LLP
- 优先权： JP2006-205711 20060728
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/44
摘要：
A display device which can be manufactured with improved material use efficiency and through a simplified manufacturing process, and a manufacturing technique thereof. A light-absorbing layer is formed, an insulating layer is formed over the light-absorbing layer, the light-absorbing layer and the insulating layer are selectively irradiated with laser light to remove an irradiated region of the insulating layer so that a first opening is formed in the insulating layer, and the light-absorbing layer is selectively removed by using the insulating layer having the first opening as a mask so that a second opening is formed in the insulating layer and the light-absorbing layer. A conductive film is formed in the second opening to be in contact with the light-absorbing layer, thereby electrically connecting to the light-absorbing layer with the insulating layer interposed therebetween.
公开/授权文献
- US20080182349A1 Method for manufacturing display device 公开/授权日：2008-07-31
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