Invention Grant
- Patent Title: Patterning methods for stretchable structures
- Patent Title (中): 可拉伸结构的图案化方法
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Application No.: US12331131Application Date: 2008-12-09
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Publication No.: US08187795B2Publication Date: 2012-05-29
- Inventor: Kanti Jain , Kevin Lin
- Applicant: Kanti Jain , Kevin Lin
- Applicant Address: US IL Urbana
- Assignee: The Board of Trustees of the University of Illinois
- Current Assignee: The Board of Trustees of the University of Illinois
- Current Assignee Address: US IL Urbana
- Agency: Greenlee Sullivan P.C.
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G01B7/16 ; G01P15/125

Abstract:
Described herein are processing techniques for fabrication of stretchable and/or flexible electronic devices using laser ablation patterning methods. The laser ablation patterning methods utilized herein allow for efficient manufacture of large area (e.g., up to 1 mm2 or greater or 1 m2 or greater) stretchable and/or flexible electronic devices, for example manufacturing methods permitting a reduced number of steps. The techniques described herein further provide for improved heterogeneous integration of components within an electronic device, for example components having improved alignment and/or relative positioning within an electronic device. Also described herein are flexible and/or stretchable electronic devices, such as interconnects, sensors and actuators.
Public/Granted literature
- US20100143848A1 PATTERNING METHODS FOR STRETCHABLE STRUCTURES Public/Granted day:2010-06-10
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