发明授权
- 专利标题: Nonvolatile semiconductor memory device and method for manufacturing same
- 专利标题(中): 非易失性半导体存储器件及其制造方法
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申请号: US12728727申请日: 2010-03-22
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公开(公告)号: US08188530B2公开(公告)日: 2012-05-29
- 发明人: Hiroyasu Tanaka , Ryota Katsumata , Hideaki Aochi , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Tomoko Fujiwara , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
- 申请人: Hiroyasu Tanaka , Ryota Katsumata , Hideaki Aochi , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Yosuke Komori , Megumi Ishiduki , Junya Matsunami , Tomoko Fujiwara , Ryouhei Kirisawa , Yoshimasa Mikajiri , Shigeto Oota
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-149399 20090624
- 主分类号: H01L21/8239
- IPC分类号: H01L21/8239 ; H01L29/78 ; H01L27/088
摘要:
A semiconductor memory device provided with a cell array section and a peripheral circuit section, the device includes: a back gate electrode; a stacked body provided on the back gate electrode; a plurality of semiconductor pillars extending in a stacking direction; connection members, each of the connection members connecting one of the semiconductor pillars to another one of the semiconductor pillars; a back-gate electrode contact applying a potential to the back gate electrode; a gate electrode provided in the peripheral circuit section; and a gate electrode contact applying a potential to the gate electrode, the back gate electrode and the gate electrode respectively including: a lower semiconductor layer; a conductive layer provided on the lower semiconductor layer; and an upper semiconductor layer provided on the conductive layer, the connection members being provided in or on the upper semiconductor layer, the back-gate electrode contact and the gate electrode contact being in contact with the conductive layer.
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