发明授权
- 专利标题: Variable resistance element and manufacturing method of the same
- 专利标题(中): 可变电阻元件及其制造方法
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申请号: US12994916申请日: 2010-04-14
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公开(公告)号: US08188833B2公开(公告)日: 2012-05-29
- 发明人: Kiyotaka Tsuji
- 申请人: Kiyotaka Tsuji
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2009-097837 20090414
- 国际申请: PCT/JP2010/002702 WO 20100414
- 国际公布: WO2010/119677 WO 20101021
- 主分类号: H01C7/10
- IPC分类号: H01C7/10
摘要:
A variable resistance element capable of increasing stability of a resistance changing operation and reducing a current necessary for changing, to a low resistance state for the first time, the variable resistance element in an initial state immediately after manufacture. The variable resistance element includes: a first electrode (101); a memory cell hole (150) formed above the first electrode (101); a first variable resistance layer (201) covering a bottom of the memory cell hole (150) and an upper surface of the first electrode (101); a second variable resistance layer (202) formed on the first variable resistance layer (201); and a second electrode (102) formed on the memory cell hole (150), in which a thickness of the first variable resistance layer (201) at the bottom of the memory cell hole (150) gradually decreases toward an edge area of the memory cell hole (150) and has a local minimum value around the edge area of the memory cell hole (150). Furthermore, an oxygen concentration in the first variable resistance layer (201) is higher than an oxygen concentration in the second variable resistance layer (202).
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