发明授权
- 专利标题: Plotting state adjusting method and device
- 专利标题(中): 绘图状态调整方法及装置
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申请号: US12293822申请日: 2007-03-16
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公开(公告)号: US08189171B2公开(公告)日: 2012-05-29
- 发明人: Naoto Kinjo , Katsuto Sumi , Ryo Kitano
- 申请人: Naoto Kinjo , Katsuto Sumi , Ryo Kitano
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2006-085145 20060327
- 国际申请: PCT/JP2007/055441 WO 20070316
- 国际公布: WO2007/111173 WO 20071004
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/54
摘要:
It is possible to set an optical magnification capable of making a recording position shift amount with respect to Y direction of the plotting point formed by a micro mirror within an allowance range from the relationship between a Y-direction distance between mirror images obtained by projecting micro mirrors constituting a DMD onto a substrate, an inclination angle of the DMD, an image pattern recording pitch, and an optical magnification.
公开/授权文献
- US20100231985A1 PLOTTING STATE ADJUSTING METHOD AND DEVICE 公开/授权日:2010-09-16
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