Invention Grant
- Patent Title: Interferometer for determining overlay errors
- Patent Title (中): 用于确定重叠错误的干涉仪
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Application No.: US12535357Application Date: 2009-08-04
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Publication No.: US08189202B2Publication Date: 2012-05-29
- Inventor: Jan Liesener , Xavier Colonna de Lega , Peter de Groot
- Applicant: Jan Liesener , Xavier Colonna de Lega , Peter de Groot
- Applicant Address: US CT Middlefield
- Assignee: Zygo Corporation
- Current Assignee: Zygo Corporation
- Current Assignee Address: US CT Middlefield
- Agency: Fish & Richardson P.C.
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.
Public/Granted literature
- US20110032535A1 INTERFEROMETER FOR DETERMINING OVERLAY ERRORS Public/Granted day:2011-02-10
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