Invention Grant
US08198609B2 Apparatus for forming nano pattern and method for forming the nano pattern using the same
有权
用于形成纳米图案的装置和使用其形成纳米图案的方法
- Patent Title: Apparatus for forming nano pattern and method for forming the nano pattern using the same
- Patent Title (中): 用于形成纳米图案的装置和使用其形成纳米图案的方法
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Application No.: US12219547Application Date: 2008-07-23
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Publication No.: US08198609B2Publication Date: 2012-06-12
- Inventor: Moo Youn Park , Jin Ha Kim , Soo Ryong Hwang , Il Hyung Jung , Jong Ho Lee
- Applicant: Moo Youn Park , Jin Ha Kim , Soo Ryong Hwang , Il Hyung Jung , Jong Ho Lee
- Applicant Address: KR Suwon
- Assignee: Samsung LED Co., Ltd
- Current Assignee: Samsung LED Co., Ltd
- Current Assignee Address: KR Suwon
- Priority: KR10-2007-0080268 20070809
- Main IPC: G21G1/00
- IPC: G21G1/00

Abstract:
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
Public/Granted literature
- US20090039293A1 Apparatus for forming nano pattern and method for forming the nano pattern using the same Public/Granted day:2009-02-12
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