Invention Grant
US08198609B2 Apparatus for forming nano pattern and method for forming the nano pattern using the same 有权
用于形成纳米图案的装置和使用其形成纳米图案的方法

Apparatus for forming nano pattern and method for forming the nano pattern using the same
Abstract:
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
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