Invention Grant
- Patent Title: Systems and methods for heating an EUV collector mirror
- Patent Title (中): 用于加热EUV收集镜的系统和方法
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Application No.: US12221313Application Date: 2008-07-31
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Publication No.: US08198612B2Publication Date: 2012-06-12
- Inventor: Juan Armando Chavez , Norbert R. Bowering
- Applicant: Juan Armando Chavez , Norbert R. Bowering
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Cymer, Inc.
- Main IPC: H01J35/20
- IPC: H01J35/20
Abstract:
As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate.
Public/Granted literature
- US20100025600A1 Systems and methods for heating an EUV collector mirror Public/Granted day:2010-02-04
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