Invention Grant
US08198649B2 Compound semiconductor substrate grown on metal layer, method for manufacturing the same, and compound semiconductor device using the same
有权
在金属层上生长的化合物半导体衬底,其制造方法以及使用其的化合物半导体器件
- Patent Title: Compound semiconductor substrate grown on metal layer, method for manufacturing the same, and compound semiconductor device using the same
- Patent Title (中): 在金属层上生长的化合物半导体衬底,其制造方法以及使用其的化合物半导体器件
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Application No.: US11982716Application Date: 2007-11-02
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Publication No.: US08198649B2Publication Date: 2012-06-12
- Inventor: Yong-Jin Kim , Doo-Soo Kim , Ho-Jun Lee , Dong-Kun Lee
- Applicant: Yong-Jin Kim , Doo-Soo Kim , Ho-Jun Lee , Dong-Kun Lee
- Applicant Address: KR Gumi
- Assignee: Siltron, Inc.
- Current Assignee: Siltron, Inc.
- Current Assignee Address: KR Gumi
- Agency: Greer, Burns & Crain, Ltd.
- Priority: KR10-2006-0109308 20061107
- Main IPC: H01L33/20
- IPC: H01L33/20

Abstract:
The present invention relates to a compound semiconductor substrate and a method for manufacturing the same. The present invention provides the manufacturing method which coats spherical balls on a substrate, forms a metal layer between the spherical balls, removes the spherical balls to form openings, and grows a compound semiconductor layer from the openings. According to the present invention, the manufacturing method can be simplified and grow a high quality compound semiconductor layer rapidly, simply and inexpensively, as compared with a conventional ELO (Epitaxial Lateral Overgrowth) method or a method for forming a compound semiconductor layer on a metal layer. And, the metal layer serves as one electrode of a light emitting device and a light reflecting film to provide a light emitting device having reduced power consumption and high light emitting efficiency.
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