发明授权
- 专利标题: Apparatus and method for manufacturing semiconductor device
- 专利标题(中): 半导体器件制造装置及方法
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申请号: US12792812申请日: 2010-06-03
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公开(公告)号: US08201329B2公开(公告)日: 2012-06-19
- 发明人: Osamu Nakamura , Kyosuke Ito
- 申请人: Osamu Nakamura , Kyosuke Ito
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权: JP2006-027737 20060203
- 主分类号: H01R43/00
- IPC分类号: H01R43/00 ; H05K13/00 ; H01L21/00 ; H01L21/64
摘要:
The manufacturing apparatus of a semiconductor device includes a jig having a plurality of holders arranged in a row, a controller for controlling the pitch of the plurality of holders arranged in a row, a support means provided with a plurality of semiconductor integrated circuits, and a support means provided with a substrate having a plurality of elements. By mounting the semiconductor integrated circuits on the respective elements by using the jig having the plurality of holders arranged in a row, semiconductor devices are manufactured.
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