发明授权
- 专利标题: Manufacturing method of organic semiconductor device
- 专利标题(中): 有机半导体器件的制造方法
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申请号: US12863538申请日: 2009-01-21
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公开(公告)号: US08202759B2公开(公告)日: 2012-06-19
- 发明人: Ken Tomino , Masanao Matsuoka , Tomomi Suzuki , Hiroki Maeda
- 申请人: Ken Tomino , Masanao Matsuoka , Tomomi Suzuki , Hiroki Maeda
- 申请人地址: JP Tokyo-to
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo-to
- 代理机构: Ladas & Parry LLP
- 优先权: JP2008-011500 20080122
- 国际申请: PCT/JP2009/050869 WO 20090121
- 国际公布: WO2009/093606 WO 20090730
- 主分类号: H01L51/40
- IPC分类号: H01L51/40
摘要:
The present invention provides a manufacturing method of an organic semiconductor device comprising a step of transferring an organic semiconductor layer to a gate insulation layer by a thermal transfer at a liquid crystal phase transition temperature of a liquid crystalline organic semiconductor material, and the step uses: an organic semiconductor layer-transferring substrate comprising a parting substrate having parting properties, and the organic semiconductor layer formed on the parting substrate and containing the liquid crystalline organic semiconductor material; and a substrate for forming an organic semiconductor device comprising a substrate, a gate electrode formed on the substrate, and the gate insulation layer formed to cover the gate electrode and having alignment properties which are capable of aligning the liquid crystalline organic semiconductor material on a surface of the gate insulation layer.
公开/授权文献
- US20110053313A1 MANUFACTURING METHOD OF ORGANIC SEMICONDUCTOR DEVICE 公开/授权日:2011-03-03
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