发明授权
- 专利标题: Nonvolatile semiconductor memory device
- 专利标题(中): 非易失性半导体存储器件
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申请号: US12727854申请日: 2010-03-19
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公开(公告)号: US08203884B2公开(公告)日: 2012-06-19
- 发明人: Masaru Kito , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Tomoko Fujiwara , Hideaki Aochi
- 申请人: Masaru Kito , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Tomoko Fujiwara , Hideaki Aochi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-169952 20090721
- 主分类号: G11C16/04
- IPC分类号: G11C16/04 ; H01L29/788 ; H01L29/792
摘要:
A nonvolatile semiconductor memory device, includes: a stacked structural unit including electrode films alternately stacked with inter-electrode insulating films; a first and second semiconductor pillars piercing the stacked structural unit; a connection portion semiconductor layer to electrically connect the first and second semiconductor pillars; a connection portion conductive layer opposing the connection portion semiconductor layer; a memory layer, an inner insulating film, and an outer insulating film provided between the first and second semiconductor layers and the electrode films and between the connection portion semiconductor layer and the connection portion conductive layer. At least a portion of a face of the connection portion conductive layer opposing the outer insulating film is a curved surface having a recessed configuration on a side of the outer insulating film.
公开/授权文献
- US20110019480A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE 公开/授权日:2011-01-27
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