发明授权
- 专利标题： Paste for emission source and electron emission element
- 专利标题（中）： 用于排放源和电子发射元件
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申请号： US12449777申请日： 2008-02-20
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公开(公告)号： US08206615B2公开(公告)日： 2012-06-26
- 发明人: Kazuki Shigeta , Takejiro Inoue , Atsushi Ikeda , Kazuki Goto
- 申请人： Kazuki Shigeta , Takejiro Inoue , Atsushi Ikeda , Kazuki Goto
- 申请人地址： JP Tokyo
- 专利权人： Toray Industries, Inc.
- 当前专利权人： Toray Industries, Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Kubovcik & Kubovcik
- 优先权： JP2007-045117 20070226
- 国际申请： PCT/JP2008/052796 WO 20080220
- 国际公布： WO2008/105278 WO 20080904
- 主分类号： H01B1/22
- IPC分类号： H01B1/22
摘要：
An object of the present invention is to provide a paste for an electron emission source, which can retain good electric contact between CNT and a cathode electrode, by containing an electrically conductive particle having a particle diameter within the optimal range. A paste for an electron emission source containing a carbon nanotube having a diameter of 1 nm or more and less than 10 nm, and an electrically conductive part having an average particle diameter of 0.1 to 1 μm.
公开/授权文献
- US20100096972A1 PASTE FOR EMISSION SOURCE AND ELECTRON ELEMENT 公开/授权日：2010-04-22