Invention Grant
US08207476B2 Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
有权
用于基板处理系统的具有不均匀绝缘层的温度控制基板支架
- Patent Title: Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
- Patent Title (中): 用于基板处理系统的具有不均匀绝缘层的温度控制基板支架
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Application No.: US12631278Application Date: 2009-12-04
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Publication No.: US08207476B2Publication Date: 2012-06-26
- Inventor: Yuji Tsukamoto , Eric J. Strang
- Applicant: Yuji Tsukamoto , Eric J. Strang
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H05B1/02
- IPC: H05B1/02 ; H05B3/68 ; F27B5/06 ; F27B5/18
Abstract:
A substrate holder for supporting a substrate in a processing system includes a temperature controlled support base having a first temperature, and a substrate support opposing the temperature controlled support base and configured to support the substrate. Also included is one or more heating elements coupled to the substrate support and configured to heat the substrate support to a second temperature above the first temperature, and a thermal insulator disposed between the temperature controlled support base and the substrate support. The thermal insulator includes a non-uniform spatial variation of the heat transfer coefficient (W/m2-K) through the thermal insulator between the temperature controlled support base and the substrate support.
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