发明授权
- 专利标题： Single phase fluid imprint lithography method
- 专利标题（中）： 单相流体压印光刻法
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申请号： US12026022申请日： 2008-02-05
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公开(公告)号： US08211214B2公开(公告)日： 2012-07-03
- 发明人: Frank Y. Xu , Niyaz Khusnatdinov
- 申请人： Frank Y. Xu , Niyaz Khusnatdinov
- 申请人地址： US TX Austin US TX Austin
- 专利权人： Molecular Imprints, Inc.,Board of Regents, The University of Texas
- 当前专利权人： Molecular Imprints, Inc.,Board of Regents, The University of Texas
- 当前专利权人地址： US TX Austin US TX Austin
- 代理商 Cameron A. King
- 主分类号： B01D19/00
- IPC分类号： B01D19/00
摘要：
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
公开/授权文献
- US20080141862A1 Single Phase Fluid Imprint Lithography Method 公开/授权日：2008-06-19
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