Invention Grant
- Patent Title: Method for reducing defect concentration in crystals
- Patent Title (中): 降低晶体缺陷浓度的方法
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Application No.: US11300660Application Date: 2005-12-12
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Publication No.: US08216370B2Publication Date: 2012-07-10
- Inventor: Mark Philip D'Evelyn , Thomas Richard Anthony , Stephen Daley Arthur , Lionel Monty Levinson , John William Lucek , Larry Burton Rowland , Suresh Shankarappa Vagarali
- Applicant: Mark Philip D'Evelyn , Thomas Richard Anthony , Stephen Daley Arthur , Lionel Monty Levinson , John William Lucek , Larry Burton Rowland , Suresh Shankarappa Vagarali
- Applicant Address: US NY Albany
- Assignee: Momentive Performance Materials Inc.
- Current Assignee: Momentive Performance Materials Inc.
- Current Assignee Address: US NY Albany
- Agent Joseph E. Waters
- Main IPC: C30B21/04
- IPC: C30B21/04

Abstract:
A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.
Public/Granted literature
- US20060096521A1 Method for reducing defect concentration in crystals Public/Granted day:2006-05-11
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