发明授权
- 专利标题: Method for reducing defect concentration in crystals
- 专利标题(中): 降低晶体缺陷浓度的方法
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申请号: US11300660申请日: 2005-12-12
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公开(公告)号: US08216370B2公开(公告)日: 2012-07-10
- 发明人: Mark Philip D'Evelyn , Thomas Richard Anthony , Stephen Daley Arthur , Lionel Monty Levinson , John William Lucek , Larry Burton Rowland , Suresh Shankarappa Vagarali
- 申请人: Mark Philip D'Evelyn , Thomas Richard Anthony , Stephen Daley Arthur , Lionel Monty Levinson , John William Lucek , Larry Burton Rowland , Suresh Shankarappa Vagarali
- 申请人地址: US NY Albany
- 专利权人: Momentive Performance Materials Inc.
- 当前专利权人: Momentive Performance Materials Inc.
- 当前专利权人地址: US NY Albany
- 代理商 Joseph E. Waters
- 主分类号: C30B21/04
- IPC分类号: C30B21/04
摘要:
A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.
公开/授权文献
- US20060096521A1 Method for reducing defect concentration in crystals 公开/授权日:2006-05-11
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