发明授权
- 专利标题： Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
- 专利标题（中）： 形成图案的方法，薄膜晶体管，显示装置，其制造方法和电视装置
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申请号： US12616491申请日： 2009-11-11
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公开(公告)号： US08222636B2公开(公告)日： 2012-07-17
- 发明人: Gen Fujii
- 申请人： Gen Fujii
- 申请人地址： JP Kanagawa-ken
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP Kanagawa-ken
- 代理机构： Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权： JP2004-088068 20040324
- 主分类号： H01L29/08
- IPC分类号： H01L29/08 ; H01L35/24 ; H01L51/00
摘要：
To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.
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