Invention Grant
- Patent Title: Methods of forming a photosensitive film
- Patent Title (中): 形成感光膜的方法
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Application No.: US12539041Application Date: 2009-08-11
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Publication No.: US08227182B2Publication Date: 2012-07-24
- Inventor: Ahn-Ho Lee , Baik-Soon Choi , Seung-Hyun Ahn , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Kyong-Ho Lee
- Applicant: Ahn-Ho Lee , Baik-Soon Choi , Seung-Hyun Ahn , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Kyong-Ho Lee
- Applicant Address: KR KR
- Assignee: Samsung Electronics Co., Ltd.,Dongwoo Fine-Chem Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.,Dongwoo Fine-Chem Co., Ltd.
- Current Assignee Address: KR KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2008-0078421 20080811; KR10-2009-0004874 20090121
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/26 ; G03F7/30 ; G03F7/40

Abstract:
In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of γ-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.
Public/Granted literature
- US20100034962A1 Methods of Forming a Photosensitive Film Public/Granted day:2010-02-11
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