Invention Grant
- Patent Title: Resistive switching in nitrogen-doped MgO
- Patent Title (中): 氮掺杂MgO中的电阻开关
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Application No.: US12636588Application Date: 2009-12-11
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Publication No.: US08227896B2Publication Date: 2012-07-24
- Inventor: Xin Jiang , Stuart Stephen Papworth Parkin , Mahesh Govind Samant , Cheng-Han Yang
- Applicant: Xin Jiang , Stuart Stephen Papworth Parkin , Mahesh Govind Samant , Cheng-Han Yang
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Daniel E. Johnson
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
Nitrogen-doped MgO insulating layers exhibit voltage controlled resistance states, e.g., a high resistance and a low resistance state. Patterned nano-devices on the 100 nm scale show highly reproducible switching characteristics. The voltage levels at which such devices are switched between the two resistance levels can be systematically lowered by increasing the nitrogen concentration. Similarly, the resistance of the high resistance state can be varied by varying the nitrogen concentration, and decreases by orders of magnitude by varying the nitrogen concentrations by a few percent. On the other hand, the resistance of the low resistance state is nearly insensitive to the nitrogen doping level. The resistance of single Mg50O50-xNx layer devices can be varied over a wide range by limiting the current that can be passed during the SET process. Associated data storage devices can be constructed.
Public/Granted literature
- US20110140762A1 Resistive Switching in Nitrogen-doped MgO Public/Granted day:2011-06-16
Information query
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