发明授权
- 专利标题: Method for manufacturing a magneto-resistance effect element and magnetic recording and reproducing apparatus
- 专利标题(中): 制造磁阻效应元件和磁记录和重放装置的方法
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申请号: US12585854申请日: 2009-09-25
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公开(公告)号: US08228643B2公开(公告)日: 2012-07-24
- 发明人: Hiromi Yuasa , Hideaki Fukuzawa , Yoshihiko Fuji , Shuichi Murakami , Michiko Hara , Kunliang Zhang , Min Li , Erhard Schreck
- 申请人: Hiromi Yuasa , Hideaki Fukuzawa , Yoshihiko Fuji , Shuichi Murakami , Michiko Hara , Kunliang Zhang , Min Li , Erhard Schreck
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba,TDK Corporation
- 当前专利权人: Kabushiki Kaisha Toshiba,TDK Corporation
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Nixon & Vanderhye, P.C.
- 优先权: JP2008-249223 20080926
- 主分类号: G11B5/39
- IPC分类号: G11B5/39
摘要:
A method for manufacturing a magneto-resistance effect element is provided. The magneto-resistance effect element includes a first magnetic layer including a ferromagnetic material, a second magnetic layer including a ferromagnetic material and a spacer layer provided between the first magnetic layer and the second magnetic layer, the spacer layer having an insulating layer and a conductive portion penetrating through the insulating layer. The method includes: forming a film to be a base material of the spacer layer; performing a first treatment using a gas including at least one of oxygen molecules, oxygen atoms, oxygen ions, oxygen plasma and oxygen radicals on the film; and performing a second treatment using a gas including at least one of nitrogen ions, nitrogen atoms, nitrogen plasma, and nitrogen radicals on the film submitted to the first treatment.
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